F03300 - SEMI F33 - Test Method for Calibration of Atmospheric Pressure Ionization Mass Spectrometer (APIMS) Revision:SEMI F33-0708 - Inactive This Specification defines the properties

This Specification defines the properties of silicon epitaxial wafers with buried layers that relate to the characteristics of photolithography

This Test Method refers to the analysis of the bulk of the materials

Standard events that document recipe execution in the process module or process area guarantee the availability of such context information

the information necessary to prepare the facility and to efficiently install semiconductor equipment

F03300 - SEMI F33 - Test Method for Calibration of Atmospheric Pressure Ionization Mass Spectrometer (APIMS) Revision:SEMI F33-0708 - Inactive This Specification defines the propertiesThis standard was technically approved by the global Gases Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on May 13, 2008. It was available at www. semi. org in June 2008. Originally published in 1998. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and